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Lanthanide oxide thin films by metalorganic chemical vapor deposition employing volatile guanidinate precursors.
The application of two novel metalorganic complexes, namely the isostructural tris(N,N'diisopropyl-2-dimethlyamido-guanidinato)gadolinium(III) (1) and tris(N,N'-diisopropyl-2-dimethlyamido-guanidinato)dysprosium(III) (2) ...
Rare-earth substituted HfO2 thin films grown by metalorganic chemical vapor deposition.
Thin films of HfGdOx and HfDyOx were deposited by metalorganic chemical vapor deposition (MOCVD) utilizing guanidinate precursors for Hf, Gd and Dy. The close match in the thermal properties of the precursors enabled the ...