• Login
    View Item 
    •   DORA Home
    • Faculty of Computing, Engineering and Media
    • School of Engineering and Sustainable Development
    • View Item
    •   DORA Home
    • Faculty of Computing, Engineering and Media
    • School of Engineering and Sustainable Development
    • View Item
    JavaScript is disabled for your browser. Some features of this site may not work without it.

    Device quality SiO2 films by liquid phase deposition (LPD) at 48°C

    Thumbnail
    Date
    2002
    Author
    Manhas, M.;
    Pease, T. J.;
    Cross, R. B. M.;
    Bose, S. C.;
    Oxley, D. P.;
    De Souza, M. M.;
    Sankara Narayanan, E. M.
    Metadata
    Show attachments and full item record
    Citation : Manhas, M. et al. (2002) Device quality SiO2 films by liquid phase deposition (LPD) at 48°C. Materials Research Society Symposium - Proceedings. 716, pp. 317-323.
    URI
    http://hdl.handle.net/2086/9246
    DOI
    http://dx.doi.org/10.1557/PROC-716-B7.9
    Research Group : Emerging Technologies Research Centre
    Research Institute : Institute of Engineering Sciences (IES)
    Peer Reviewed : Yes
    Collections
    • School of Engineering and Sustainable Development [1938]

    Submission Guide | Reporting Guide | Reporting Tool | DMU Open Access Libguide | Take Down Policy | Connect with DORA
    DMU LIbrary
     

     

    Browse

    All of DORACommunities & CollectionsAuthorsTitlesSubjects/KeywordsResearch InstituteBy Publication DateBy Submission DateThis CollectionAuthorsTitlesSubjects/KeywordsResearch InstituteBy Publication DateBy Submission Date

    My Account

    Login

    Submission Guide | Reporting Guide | Reporting Tool | DMU Open Access Libguide | Take Down Policy | Connect with DORA
    DMU LIbrary