Intelligent control of low pressure plasma processing.

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dc.contributor.author Al-Kuzee, J.
dc.contributor.author Matsuura, T.
dc.contributor.author Hopgood, Adrian A.
dc.contributor.author Nolle, L.
dc.contributor.author Goodyear, A.
dc.contributor.author Picton, P. D.
dc.contributor.author Braithwaite, Nicholas (Nicholas St. J.)
dc.date.accessioned 2009-02-25T16:49:26Z
dc.date.available 2009-02-25T16:49:26Z
dc.date.issued 2003
dc.identifier.citation Al-Kuzee, J.;Matsuura, T.; Goodyer, A.;Nolle, L.;Hopgood, A. A.;Picton, P. D.;Braithwaite, N. S. (2003) Intelligent control of low pressure plasma processing. 29th Annual Conference of the IEEE Industrial Electronics Society (IECON\'03), 2 , pp. 1932 - 1937 en
dc.identifier.uri http://hdl.handle.net/2086/920
dc.language.iso en en
dc.title Intelligent control of low pressure plasma processing. en
dc.type Conference
dc.researchgroup Centre for Computational Intelligence


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