Electrically air-stable ZnO thin film produced by reactive RF magnetron sputtering for thin film transistors applications.

De Montfort University Open Research Archive

Show simple item record

dc.contributor.author Ngwashi, Divine K.
dc.contributor.author Cross, R. B. M.
dc.contributor.author Paul, Shashi
dc.date.accessioned 2010-02-03T14:32:25Z
dc.date.available 2010-02-03T14:32:25Z
dc.date.issued 2009
dc.identifier.citation Ngwashi, D. K. Cross, R. B. M. and Paul, S. (2009) Electrically air-stable ZnO thin film produced by reactive RF magnetron sputtering for thin film transistors applications. Materials Research Society Symposium Proceedings, 1201, pp. 153-158. en
dc.identifier.isbn 9781605111742
dc.identifier.issn 0272-9172
dc.identifier.uri http://hdl.handle.net/2086/3332
dc.language.iso en en
dc.title Electrically air-stable ZnO thin film produced by reactive RF magnetron sputtering for thin film transistors applications. en
dc.type Conference en
dc.identifier.doi http://dx.doi.org/10.1557/PROC-1201-H05-39
dc.researchgroup Emerging Technologies Research Centre en
dc.peerreviewed Yes en


Files in this item

Files Size Format View

There are no files associated with this item.

This item appears in the following Collection(s)

Show simple item record