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    Electrically air-stable ZnO thin film produced by reactive RF magnetron sputtering for thin film transistors applications.

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    Date
    2009
    Author
    Ngwashi, Divine K.;
    Cross, R. B. M.;
    Paul, Shashi
    Metadata
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    Citation : Ngwashi, D. K. Cross, R. B. M. and Paul, S. (2009) Electrically air-stable ZnO thin film produced by reactive RF magnetron sputtering for thin film transistors applications. Materials Research Society Symposium Proceedings, 1201, pp. 153-158.
    URI
    http://hdl.handle.net/2086/3332
    DOI
    http://dx.doi.org/10.1557/PROC-1201-H05-39
    ISBN : 9781605111742
    ISSN : 0272-9172
    Research Group : Emerging Technologies Research Centre
    Research Institute : Institute of Engineering Sciences (IES)
    Peer Reviewed : Yes
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    • School of Engineering and Sustainable Development [1938]

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