Electrically air-stable ZnO thin film produced by reactive RF magnetron sputtering for thin film transistors applications.

De Montfort University Open Research Archive

Electrically air-stable ZnO thin film produced by reactive RF magnetron sputtering for thin film transistors applications.

Ngwashi, Divine K. ; Cross, R. B. M. ; Paul, Shashi
Citation: Ngwashi, D. K. Cross, R. B. M. and Paul, S. (2009) Electrically air-stable ZnO thin film produced by reactive RF magnetron sputtering for thin film transistors applications. Materials Research Society Symposium Proceedings, 1201, pp. 153-158.
URI: http://hdl.handle.net/2086/3332
DOI: http://dx.doi.org/10.1557/PROC-1201-H05-39
ISBN: 9781605111742
ISSN: 0272-9172
Research Group: Emerging Technologies Research Centre
Peer Reviewed: Yes
Date: 2009

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