Electrically air-stable ZnO thin film produced by reactive RF magnetron sputtering for thin film transistors applications.

Date

2009

Author

Ngwashi, Divine K.;

Cross, R. B. M.;

Paul, Shashi

Metadata

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Citation : Ngwashi, D. K. Cross, R. B. M. and Paul, S. (2009) Electrically air-stable ZnO thin film produced by reactive RF magnetron sputtering for thin film transistors applications. Materials Research Society Symposium Proceedings, 1201, pp. 153-158.

URI

http://hdl.handle.net/2086/3332

DOI

http://dx.doi.org/10.1557/PROC-1201-H05-39

ISBN : 9781605111742

ISSN : 0272-9172

Research Group : Emerging Technologies Research Centre

Research Institute : Institute of Engineering Sciences (IES)

Peer Reviewed : Yes

Collections

• School of Engineering and Sustainable Development [1938]