Electrically air-stable ZnO thin film produced by reactive RF magnetron sputtering for thin film transistors applications.
Date
2009
Citation : Ngwashi, D. K. Cross, R. B. M. and Paul, S. (2009) Electrically air-stable ZnO thin film produced by reactive RF magnetron sputtering for thin film transistors applications. Materials Research Society Symposium Proceedings, 1201, pp. 153-158.
ISBN : 9781605111742
ISSN : 0272-9172
Research Group : Emerging Technologies Research Centre
Research Institute : Institute of Engineering Sciences (IES)
Peer Reviewed : Yes